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Self-aligned process for forming microlenses at the tips of vertical silicon nanowires by atomic layer deposition

机译:用于在垂直尖端形成微透镜的自对准工艺   通过原子层沉积的硅纳米线

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摘要

The microlens is a key enabling technology in optoelectronics, permittinglight to be efficiently coupled to and from devices such as image sensors andlight-emitting diodes. Their ubiquitous nature motivates the development of newfabrication techniques, since existing methods face challenges as microlensesare scaled to smaller dimensions. Here, we demonstrate the formation ofmicrolenses at the tips of vertically-oriented silicon nanowires via a rapidatomic layer deposition (ALD) process. The nature of the process is such thatthe microlenses are centered on the nanowires, and there is a self-limitingeffect on the final sizes of the microlenses arising from the nanowire spacing.Finite difference time domain electromagnetic simulations are performed ofmicrolens focusing properties, including showing their ability to enhancevisible-wavelength absorption in silicon nanostructures.
机译:微透镜是光电技术中的关键启用技术,它可以使光有效地耦合到诸如图像传感器和发光二极管之类的设备,或与之耦合。它们的无处不在的性质激励了新制造技术的发展,因为随着微透镜缩放到较小尺寸,现有方法面临挑战。在这里,我们演示了通过快速原子层沉积(ALD)工艺在垂直取向的硅纳米线尖端形成微透镜。该过程的性质是使微透镜集中在纳米线上,并且由于纳米线间距而对微透镜的最终尺寸产生自限制效应。对微透镜的聚焦特性进行了时域有限差分电磁模拟,包括显示它们的聚焦特性。增强硅纳米结构中可见光吸收的能力。

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